ʻO ka nānāʻana i ka'ōnaehana optical optics optics
ʻO ka hapa nui o ka hapa maikaʻi loa,ʻo ia hoʻi ka lens liʻiliʻi, eʻike ana i ka hoʻonuiʻiaʻana o nā leʻa a me ka neʻeʻana o ka lens. ʻO ke kiʻi Galvow he aniani ma ka'ōnaehana galvanometer.
(1) Optimization o ka hoʻolālā lens
(2) Lens kiʻekiʻe maikaʻi loa i ka paepae i ka paepae:> 30J / cm2 10ns 10ns
(3) Ultra-Ultra-haʻahaʻa haʻahaʻa haʻahaʻa, ka helu komoʻana: <20ppm
(4)ʻO ka mānoanoa galvanomomet i ka pae o ka'āpana: 1:35
(5) lens i ka pololei: <= λ / 5
Nā lens
| ʻO Max EXTRY PUPil (MM) | ʻO nā Optics 1ʻO ka diameter (mm) | Opties 2 diameter (mm) | Optipes 3 diameter (mm) | 'Ōpala (mm) | Wehewehe of scanner (mm) | Hauhā |
| 8 | 15 | 55 | 55 | 600x600 800x800 | 30 | 10.6um |
| 12 | 22 | 55 | 55 | 1600x1600 | 30 | |
| 8 | 16 | 55 | 55 | 600x600 800x800 | 30 | 1030-1090NM |
| 8 | 15 | 35 | 35 | 300x300 | 10 | 532Nm |
| 8 | 15 | 35 | 35 | 300x300 | 10 | 355nm |
Hōʻikeʻana i ka aniani
| Māhele wehewehe | Ka diameter (mm) | Mānoanoa (mm) | Waiwai | Pāpale |
| KĀīkoʻo Poio | 25.4 | 3 | Silikino | HR@10.6um,Aoi: 45 ° |
| KĀīkoʻo Poio | 30 | 4 | Silikino | HR@10.6um,Aoi: 45 ° |
| Hōʻikeʻo Fiber | 25.4 | 6.35 | ʻO Silica Silica | HR @ 1030-1090NM, Aoi: 45 ° |
| Hōʻikeʻo Fiber | 30 | 5 | ʻO Silica Silica | HR @ 1030-1090NM, Aoi: 45 ° |
| Hōʻikeʻo Fiber | 50 | 10 | ʻO Silica Silica | HR @ 1030-1090NM, Aoi: 45 ° |
| 532 Huanau | 25.4 | 6 | ʻO Silica Silica | ʻO HR @ 515-540NM / 532nm, Aoi: 45 ° ° |
| 532 Huanau | 25.4 | 6.35 | ʻO Silica Silica | ʻO HR @ 515-540NM / 532nm, Aoi: 45 ° ° |
| 532 Huanau | 30 | 5 | ʻO Silica Silica | ʻO HR @ 515-540NM / 532nm, Aoi: 45 ° ° |
| 532 Huanau | 50 | 10 | ʻO Silica Silica | ʻO HR @ 515-540NM / 532nm, Aoi: 45 ° ° |
| 355 hiʻohiʻona | 25.4 | 6 | ʻO Silica Silica | ʻO Ka HR @ 355nm & 433nm, AoI: 45 ° |
| 355 hiʻohiʻona | 25.4 | 6.35 | ʻO Silica Silica | ʻO Ka HR @ 355nm & 433nm, AoI: 45 ° |
| 355 hiʻohiʻona | 25.4 | 10 | ʻO Silica Silica | ʻO Ka HR @ 355nm & 433nm, AoI: 45 ° |
| 355 hiʻohiʻona | 30 | 5 | ʻO Silica Silica | ʻO Ka HR @ 355nm & 433nm, AoI: 45 ° |
ʻO ke Kohiʻo Galvow
| Māhele wehewehe | ʻO Max EXTRY PUPil (MM) | Waiwai | Pāpale | Hauhā |
| 55mml * 35mmw * 3.5mmt-x 62mml * 43mmw * 3.5mmt-y | 30 | Silikino | MMR@10.6um | 10.6um |
| 55mml * 35mmw * 3.5mmt-x 62mml * 43mmw * 3.5mmt-y | 30 | ʻO Silica Silica | HR @ 1030-1090NM | 1030-1090NM |
| 55mml * 35mmw * 3.5mmt-x 62mml * 43mmw * 3.5mmt-y | 30 | ʻO Silica Silica | Hr @ 922nm | 532Nm |
| 55mml * 35mmw * 3.5mmt-x 62mml * 43mmw * 3.5mmt-y | 30 | ʻO Silica Silica | HR @ 355nm | 355nm |
Mea pale i kaʻana
| Ka diameter (mm) | Mānoanoa (mm) | Waiwai | Pāpale |
| 75 | 3 | Znse | AR/AR@10.6um |
| 80 | 3 | Znse | AR/AR@10.6um |
| 90 | 3 | Znse | AR/AR@10.6um |
| 90x60 | 5 | Znse | AR/AR@10.6um |
| 90x64 | 2.5 | Znse | AR/AR@10.6um |
| 90x70 | 3 | Znse | AR/AR@10.6um |
